Principal EUV Mask Technology R&D Engineer

Responsibilities

• Lead development of EUV mask blank materials and mask processes, including film stack design, deposition, etch, clean, and patterning quality
• Drive High-NA EUV readiness through material selection, mask design, stitching, lithography performance, and lifetime improvement
• Translate lithography requirements into manufacturable mask solutions in partnership with OPC, design, and lithography teams
• Lead data-driven R&D using DOE and fundamental analysis to improve yield, reliability, and manufacturability
• Mentor engineers and transition developed technologies to FEOL process engineering teams

Requirements

• MS or PhD in Materials Science, Physics, Chemistry, Chemical Engineering, or a related field
• Hands-on experience with EUV mask technology, thin films, materials, or process characterization
• Strong problem-solving skills and demonstrated innovation in semiconductor manufacturing
• Ability to communicate technical concepts clearly across R&D, manufacturing, and supplier teams

Preferred Qualifications

• Experience with High-NA EUV, mask characterization, or mask reliability
• Background in mask material analysis, film stack simulation, or mask lifetime improvement
• Experience collaborating with equipment or blank suppliers on advanced technology development
• Familiarity with roadmap planning or defining tool/process capability requirements

Benefits

• Choice of medical, dental, and vision plans
• Income protection programs for illness or injury
• Paid family leave
• Robust paid time-off program and paid holidays

About the Company

Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever.